id: a3c6dc86ab7c44988a87d52a46f8655e
parent_id: 
item_type: 1
item_id: 9b054c138338408f81f3af2f6b5beca4
item_updated_time: 1764345478315
title_diff: "[{\"diffs\":[[1,\"芯片光刻的流程详解\"]],\"start1\":0,\"start2\":0,\"length1\":0,\"length2\":9}]"
body_diff: "[{\"diffs\":[[1,\"<html>\\\r\\\n<head>\\\r\\\n  <title>芯片光刻的流程详解</title>\\\r\\\n  <basefont face=\\\"微软雅黑\\\" size=\\\"2\\\" />\\\r\\\n  <meta http-equiv=\\\"Content-Type\\\" content=\\\"text/html;charset=utf-8\\\" />\\\r\\\n  <meta name=\\\"exporter-version\\\" content=\\\"YXBJ Windows/608924 (zh-CN, DDL); Windows/10.0.0 (Win64); EDAMVersion=V2;\\\"/>\\\r\\\n  <style>\\\r\\\n\\tbody, td {\\\r\\\n\\t  font-family: 微软雅黑;\\\r\\\n\\t  font-size: 12pt;\\\r\\\n\\t}\\\r\\\n  </style>\\\r\\\n</head>\\\r\\\n<body>\\\r\\\n<a name=\\\"11703\\\"></a>\\\r\\\n<h1>芯片光刻的流程详解</h1>\\\r\\\n\\\r\\\n<div><span style=\\\"margin:0px;\\\"><div style=\\\"padding:8px 0px;margin:8px auto;max-width:700px;\\\"> <div style=\\\"margin:0;position:relative;padding:20px 15px 15px;background-color:#fff\\\"><div style=\\\"margin:0;padding:0\\\"><h2 style=\\\"margin:0;padding:0;margin-bottom:10px;line-height:1.4;font-weight:400;font-size:24px\\\"> 芯片光刻的流程详解 </h2><div style=\\\"margin:0;padding:0;margin-bottom:18px;line-height:20px;font-size:0\\\"><em style=\\\"margin:0;padding:0;font-style:normal;display:inline-block;vertical-align:middle;margin-right:8px;margin-bottom:10px;font-size:16px;color:#8c8c8c\\\">2017-09-09</em><a href=\\\"http://mp.weixin.qq.com/s?__biz=MzU3OTA0MjQ3Mg==&amp;mid=2247497271&amp;idx=1&amp;sn=4e8c111be91a013079ff216e40209e1d&amp;chksm=fd6e9bf0ca1912e6dfd3ca8e4a6fe1009c586e0df499a4ea76c94bba1ee7320c567e3aa81bd9&amp;mpshare=1&amp;scene=1&amp;srcid=0909Fc7DXmGECER9bQYuyBLR##\\\" style=\\\"margin:0;padding:0;color:#607fa6;text-decoration:none;display:inline-block;vertical-align:middle;margin-right:8px;margin-bottom:10px;font-size:16px\\\">半导体行业观察</a></div><div style=\\\"margin:0;padding:0;overflow:hidden;color:#3e3e3e\\\"><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;white-space:normal;line-height:25.6px\\\"><img src=\\\":/035fac368f4d4a67aa17b0494ee9ed1c\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;white-space:normal;line-height:25.6px;letter-spacing:1px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(136,136,136);font-family:Calibri;font-size:14px;line-height:25.6px;white-space:pre-wrap\\\">来源：本文内容由半导体行业观察整理</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;white-space:normal;line-height:25.6px;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在集成电路的制造过程中，有一个重要的环节——光刻，正因为有了它，我们才能在微小的芯片上实现功能。现代刻划技术可以追溯到190年以前，1822年法国人Nicephore niepce在各种材料光照实验以后，开始试图复制一种刻蚀在油纸上的印痕（图案)，他将油纸放在一块玻璃片上，玻片上涂有溶解在植物油中的沥青。经过2、3小时的日晒，透光部分的沥青明显变硬，而不透光部分沥青依然软并可被松香和植物油的混合液洗掉。通过用强酸刻蚀玻璃板，Niepce在1827年制作了一个d’Amboise主教的雕板相的复制品。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">Niepce的发明100多年后，即第二次世界大战期间才第一应用于制作印刷电路板，即在塑料板上制作铜线路。到1961年光刻法被用于在Si上制作大量的微小晶体管，当时分辨率5um，如今除可见光光刻之外，更出现了X-ray和荷电粒子刻划等更高分辨率方法。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">所谓光刻，根据维基百科的定义，这是半导体器件制造工艺中的一个重要步骤，该步骤利用曝光和显影在光刻胶层上刻画几何图形结构，然后通过刻蚀工艺将光掩模上的图形转移到所在衬底上。这里所说的衬底不仅包含硅晶圆，还可以是其他金属层、介质层，例如玻璃、SOS中的蓝宝石。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻的基本原理是利用光致抗蚀剂（或称光刻胶）感光后因光化学反应而形成耐蚀性的特点，将掩模板上的图形刻制到被加工表面上。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/96b86bd6ca9643e181c06612967a50ad\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em;text-align:center\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">光刻原理意图</em></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻不是一个简单的过程，它要经历很多步骤：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/30f452117bca443f98ea69c2e2f26961\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em;text-align:center\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">光刻的工序</em></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">下面我们来详细介绍一下光刻的工序：</p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/3988f3438e6d4fe491e04d3b3f8b0a18\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">清洗硅片的目的是去除污染物去除颗粒、减少针孔和其它缺陷，提高光刻胶黏附性</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">基本步骤：化学清洗——漂洗——烘干。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/e144bc3381ae4fd1a0e6e87800b163ff\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">硅片经过不同工序加工后，其表面已受到严重沾污，一般讲硅片表面沾污大致可分在三类：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">A. 有机杂质沾污： 可通过有机试剂的溶解作用，结合超声波清洗技术来</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">去除。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">B. 颗粒沾污：运用物理的方法可采机械擦洗或超声波清洗技术来去除粒径 ≥ 0.4 μm颗粒，利用兆声波可去除 ≥ 0.2 μm颗粒。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">C. 金属离子沾污：必须采用化学的方法才能清洗其沾污，硅片表面金属杂质沾污有两大类：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　　 </p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a. 一类是沾污离子或原子通过吸附分散附着在硅片表面。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　 　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b. 另一类是带正电的金属离子得到电子后面附着（尤如“电镀”）到硅片表面。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">硅抛光片的化学清洗目的就在于要去除这种沾污，一般可按下述办法进行清洗去除沾污。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　 </p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a. 使用强氧化剂使“电镀”附着到硅表面的金属离子、氧化成金属，溶解在清洗液中或吸附在硅片表面。 </p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　 　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b. 用无害的小直径强正离子（如H+）来替代吸附在硅片表面的金属离子，使之溶解于清洗液中。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　 　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">c. 用大量去离水进行超声波清洗，以排除溶液中的金属离子。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">　　</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">自1970年美国RCA实验室提出的浸泡式RCA化学清洗工艺得到了广泛应用，1978年RCA实验室又推出兆声清洗工艺，近几年来以RCA清洗理论为基础的各种清洗技术不断被开发出来，例如：美国FSI公司推出离心喷淋式化学清洗技术、美国原CFM公司推出的Full-Flow systems封闭式溢流型清洗技术、美国VERTEQ公司推出的介于浸泡与封闭式之间的化学清洗技术（例Goldfinger Mach2清洗系统）、美国SSEC公司的双面檫洗技术（例M3304 DSS清洗系统）、 日本提出无药液的电介离子水清洗技术（用电介超纯离子水清洗）使抛光片表面洁净技术达到了新的水平、以HF / O3为基础的硅片化学清洗技术。</p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/818aca04ef51410788f3124f74292b9d\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">由于光刻胶中含有溶剂，所以对于涂好光刻胶的硅片需要在80度左右的。硅片脱水烘焙能去除圆片表面的潮气、增强光刻胶与表面的黏附性、通常大约100 °C。这是与底胶涂覆合并进行的。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">底胶涂覆增强光刻胶(PR)和圆片表面的黏附性。广泛使用:  (HMDS)六甲基二硅胺、在PR旋转涂覆前HMDS蒸气涂覆、PR涂覆前用冷却板冷却圆片。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/c8409295062d420db5f99ce3234de6a9\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em;text-align:center\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">预烘和底胶蒸气涂覆</em></span></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/cc25e44bd88142f5a60d05303102c6f2\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻胶涂覆通常的步骤是在涂光刻胶之前，先在900-1100度湿氧化。氧化层可以作为湿法刻蚀或B注入的膜版。作为光刻工艺自身的第一步，一薄层的对紫外光敏感的有机高分子化合物，即通常所说的光刻胶，要涂在样品表面(SiO2)。首先光刻胶被从容器中取出滴布到置于涂胶机中的样品表面，(由真空负压将样品固定在样品台上)，样品然后高速旋转，转速由胶粘度和希望胶厚度确定。在这样的高速下，胶在离心力的作用下向边缘流动。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">涂胶工序是图形转换工艺中最初的也是重要的步骤。涂胶的质量直接影响到所加工器件的缺陷密度。为了保证线宽的重复性和接下去的显影时间，同一个样品的胶厚均匀性和不同样品间的胶厚一致性不应超过±5nm(对于1.5um胶厚为±0.3%)。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻胶的目标厚度的确定主要考虑胶自身的化学特性以及所要复制图形中线条的及间隙的微细程度。太厚胶会导致边缘覆盖或连通、小丘或田亘状胶貌、使成品率下降。在MEMS中、胶厚(烤后)在0.5-2um之间，而对于特殊微结构制造，胶厚度有时希望1cm量级。在后者，旋转涂胶将被铸胶或等离子体胶聚合等方法取代。常规光刻胶涂布工序的优化需要考虑滴胶速度、滴胶量、转速、环境温度和湿度等，这些因素的稳定性很重要。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在这里说一下，光刻胶的主要成分有一种聚合物(树脂)、敏化剂和溶剂。聚合物在被辐照时结构变化，溶剂使其能被甩胶并在样品表面形成薄膜，敏化剂控制聚合相的化学反应。不含有敏化剂的光刻胶有时称为单元或一元体系，而含有敏化剂使则称为二元体系。溶剂或其它添加物通常不计入元数，因为它们不直接参与光刻胶的光化学反应。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">根据性质的不一样，光刻胶可以分为正胶和负胶。      </p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在工艺发展的早期，负胶一直在光刻工艺中占主导地位，随着VLSI IC和2～5微米图形尺寸的出现，负胶已不能满足要求。随后出现了正胶，但正胶的缺点是粘结能力差。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">      </p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">用正胶需要改变掩膜版的极性，这并不是简单的图形翻转。因为用掩膜版和两种不同光刻胶结合，在晶园表面光刻得到的尺寸是不一样的，由于光在图形周围的衍射效应，使得用负胶和亮场掩膜版组合在光刻胶层上得到的图形尺寸要比掩膜版上的图形尺寸小。用正胶和暗场掩膜版组合会使光刻胶层上的图形尺寸变大。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/30b6522cee2944a7810e84ea47f06843\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em;text-align:center\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">光刻胶涂覆</em></span></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/6ef7f4f1f3b24714b243482a0769a571\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">完成光刻胶的涂抹之后，需要进行软烘干操作，这一步骤也被称为前烘。前烘能够蒸发光刻胶中的溶剂溶剂、能使涂覆的光刻胶更薄。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在液态的光刻胶中，溶剂成分占65％－85％。虽然在甩胶之后，液态的光刻胶已经成为固态的薄膜，但仍有10％－30％的溶剂，容易沾污灰尘。通过在较高温度下进行烘培，可以使溶剂从光刻胶中挥发出来（前烘后溶剂含量降至5％左右），从而降低了灰尘的沾污。同时，这一步骤还可以减轻因高速旋转形成的薄膜应力，从而提高光刻胶 衬底上的附着性。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在前烘过程中，由于溶剂挥发，光刻胶厚度也会减薄，一般减薄的幅度为10％－20％左右。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/27216af63452424caf3ec5b5a8432770\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em;text-align:center\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">Baking Systems</em></span></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/0810d18444d249528a854ba64b742a22\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻对准技术是曝光前一个重要步骤作为光刻的三大核心技术之一，一般要求对准精度为最<span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:1.75em\\\">细线宽尺寸的 1/7---1/10。随着光刻分辨力的提高 ，对准精度要求也越来越高 ，例如针对 45am线宽尺寸 ，对准精度要求在5am 左右。</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">受光刻分辨力提高的推动 ，对准技术也经历 迅速而多样的发展 。从对准原理上及标记结 构分类 ，对准技术从早期的投影光刻中的几何成像对准方式 ，包括视频图像对准、双目显微镜对准等，一直到后来的波带片对准方式 、干涉强度对准 、激光外差干涉以及莫尔条纹对准方式 。从对准信号上分 ，主要包括标记的显微图像对准 、基于光强信息的对准和基于相位信息对准。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/17cc826dce5c4709802142afe969daef\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">对准法则是第一次光刻只是把掩膜版上的Y轴与晶园上的平边成90º，如图所示。接下来的掩膜版都用对准标记与上一层带有图形的掩膜对准。对准标记是一个特殊的图形（见图），分布在每个芯片图形的边缘。经过光刻工艺对准标记就永远留在芯片表面，同时作为下一次对准使用。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(0,0,0)\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">对准方法包括：</strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、预对准，通过硅片上的notch或者flat进行激光自动对准</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、通过对准标志，位于切割槽上。另外层间对准，即套刻精度,保证图形与硅片上已经存在的图形之间的对准。</p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/4a69937f19d145cbafed13554e42bdd6\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在这一步中，将使用特定波长的光对覆盖衬底的光刻胶进行选择性地照射。光刻胶中的感光剂会发生光化学反应，从而使正光刻胶被照射区域（感光区域）、负光刻胶未被照射的区域（非感光区）化学成分发生变化。这些化学成分发生变化的区域，在下一步的能够溶解于特定的显影液中。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">在接受光照后，正性光刻胶中的感光剂DQ会发生光化学反应，变为乙烯酮，并进一步水解为茚并羧酸（Indene-Carboxylic-Acid, CA），羧酸在碱性溶剂中的溶解度比未感光部分的光刻胶高出约100倍，产生的羧酸同时还会促进酚醛树脂的溶解。利用感光与未感光光刻胶对碱性溶剂的不同溶解度，就可以进行掩膜图形的转移。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:1.75em\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(0,0,0)\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:1.75em\\\">曝光方法：</span></strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、接触式曝光（Contact Printing）掩膜板直接与光刻胶层接触。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、接近式曝光（Proximity Printing）掩膜板与光刻胶层的略微分开，大约为10～50μm。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">c、投影式曝光（Projection Printing）。在掩膜板与光刻胶之间使用透镜聚集光实现曝光。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">d、步进式曝光(Stepper)</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">这里特别说一下投影式曝光的分类：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">曝光中最重要的两个参数是：</strong></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">1.曝光能量（Energy）</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">2.焦距（Focus）</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">如果能量和焦距调整不好，就不能得到要求的分辨率和大小的图形。表现为图形的关键尺寸超出要求的范围。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;text-align:center\\\"><img src=\\\":/d113ab6fb4444cfc90a853392e654553\\\" type=\\\"image/png\\\" data-filename=\\\"0.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/a5879dbb163b43b18db28c6146c30258\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">通过在曝光过程结束后加入显影液，正光刻胶的感光区、负光刻胶的非感光区，会溶解于显影液中。这一步完成后，光刻胶层中的图形就可以显现出来。为了提高分辨率，几乎每一种光刻胶都有专门的显影液，以保证高质量的显影效果。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">显影工序使将在曝光过程中形成的隐性图形成为光刻胶在与不在的显性图形，以作为下一步加工的膜版。显影中进行的是选择性溶解的过程，最重要的是曝光区和未曝光区之间溶解率的比值(DR)。商用正胶有大于1000的DR比，在曝光区溶解速率为3000nm/min，在未曝光区只有几nm/min。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">现在有二种显影方法，<strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">一是湿显影</strong>，他在IC和微加工中正广泛使用，<strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">另一种是干显影。</strong></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、整盒硅片浸没式显影（Batch Development）。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">缺点：显影液消耗很大；显影的均匀性差；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、连续喷雾显影（Continuous Spray Development）/自动旋转显影（Auto-rotation Development）。一个或多个喷嘴喷洒显影液在硅片表面，同时硅片低速旋转（100～500rpm）。喷嘴喷雾模式和硅片旋转速度是实现硅片间溶 解率和均匀性的可重复性的关键调节参数。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">c、水坑（旋覆浸没）式显影（Puddle Development）。喷覆足够（不能太多，最小化背面湿度）的显影液到硅片表面，并形成水坑形状（显影液的流动保持较低，以减少边缘显影速率的变 化）。硅片固定或慢慢旋转。一般采用多次旋覆显影液：第一次涂覆、保持10～30秒、去除；第二次涂覆、保持、去除。然后用去离子水冲洗（去除硅片两面的 所有化学品）并旋转甩干。优点：显影液用量少；硅片显影均匀；最小化了温度梯度。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">显影液：</strong></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、正性光刻胶的显影液。正胶的显影液位碱性水溶液。KOH和NaOH因为会带来可 动离子污染（MIC，Movable Ion Contamination），所以在IC制造中一般不用。最普通的正胶显影液是四甲基氢氧化铵（TMAH）（标准当量浓度为0.26，温度 15～250C）。在I线光刻胶曝光中会生成羧酸，TMAH显影液中的碱与酸中和使曝光的光刻胶溶解于显影液，而未曝光的光刻胶没有影响；在化学放大光刻 胶（CAR，Chemical Amplified Resist）中包含的酚醛树脂以PHS形式存在。CAR中的PAG产生的酸会去除PHS中的保护基团（t-BOC），从而使PHS快速溶解于TMAH显 影液中。整个显影过程中，TMAH没有同PHS发生反应。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、负性光刻胶的显影液。二甲苯。清洗液为乙酸丁脂或乙醇、三氯乙烯。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">显影中的常见问题：</strong></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、显影不完全（Incomplete Development）。表面还残留有光刻胶。显影液不足造成；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、显影不够（Under Development）。显影的侧壁不垂直，由显影时间不足造成；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">c、过度显影（Over Development）。靠近表面的光刻胶被显影液过度溶解，形成台阶。显影时间太长。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;text-align:center\\\"><img src=\\\":/32bbf5ce3b744247a2c717fffb415f7a\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/a8652c306946488e921beb45e080cb12\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">刻胶显影完成后，图形就基本确定，不过还需要使光刻胶的性质更为稳定。硬烘干可以达到这个目的，这一步骤也被称为坚膜。在这过程中，利用高温处理，可以除去光刻胶中剩余的溶剂、增强光刻胶对硅片表面的附着力，同时提高光刻胶在随后刻蚀和离子注入过程中的抗蚀性能力。另外，高温下光刻胶将软化，形成类似玻璃体在高温下的熔融状态。这会使光刻胶表面在表面张力作用下圆滑化，并使光刻胶层中的缺陷（如针孔）减少，这样修正光刻胶图形的边缘轮廓。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">用O2等离子体对样品整体处理，以清除显影后可能的非望残留叫de-scumming。特别是负胶但也包括正胶，在显影后会在原来胶-基板界面处残留聚合物薄层，这个问题在结构小于1um或大深-宽比的结构中更为严重。当然在De-scumming过程中留胶厚度也会降低，但是影响不会太大。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">最后，在刻蚀或镀膜之前需要硬烤以去除残留的显影液和水，并退火以改善由于显影过程渗透和膨胀导致的界面接合状况。同时提高胶的硬度和提高抗刻蚀性。硬烤温度一般高达120度以上，时间也在20分左右。主要的限制是温度过高会使图形边缘变差以及刻蚀后难以去除。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">方法：热板，100～1300C（略高于玻璃化温度Tg），1～2分钟。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">目的：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、完全蒸发掉光刻胶里面的溶剂（以免在污染后续的离子注入环境，例如DNQ酚醛树脂 光刻胶中的氮会引起光刻胶局部爆裂）；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、坚膜，以提高光刻胶在离子注入或刻蚀中保护下表面的能力；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">c、进一步增强光刻胶与硅片表面之间的黏附性；</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">d、进 一步减少驻波效应（Standing Wave Effect）。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">常见问题：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">a、烘烤不足（Underbake）。减弱光刻胶的强度（抗刻蚀能力和离子注入中 的阻挡能力）；降低针孔填充能力（Gapfill Capability for the needle hole）；降低与基底的黏附能力。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">b、烘烤过度（Overbake）。引起光刻胶的流动，使图形精度降低，分辨率变差。另外还可以用深紫外线（DUV，Deep Ultra-Violet）坚膜。使正性光刻胶树脂发生交联形成一层薄的表面硬壳，增加光刻胶的热稳定性。在后面的等离子刻蚀和离子注入（125～2000C）工艺中减少因光刻胶高温流动而引起分辨率的降低。</p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/e5ea011fb7e94f3382f30a52d3eec7e4\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">刻蚀（英语：etching）是半导体器件制造中利用化学途径选择性地移除沉积层特定部分的工艺。刻蚀对于器件的电学性能十分重要。如果刻蚀过程中出现失误，将造成难以恢复的硅片报废，因此必须进行严格的工艺流程控制。半导体器件的每一层都会经历多个刻蚀步骤。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">刻蚀一般分为电子束刻蚀和光刻，光刻对材料的平整度要求很高，因此，需要很高的清洁度。 但是，对于电子束刻蚀，由于电子的波长极短，因此分辨率与光刻相比要好的多。 因为不需要掩模板，因此对平整度的要求不高，但是电子束刻蚀很慢，而且设备昂贵。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">对于大多数刻蚀步骤，晶圆上层的部分位置都会通过“罩”予以保护，这种罩不能被刻蚀，这样就能对层上的特定部分进行选择性地移除。在有的情况中，罩的材料为光阻性的，这和光刻中利用的原理类似。而在其他情况中，刻蚀罩需要耐受某些化学物质，氮化硅就可以用来制造这样的“罩”。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><img src=\\\":/bd0c4ab1c03f4e4fafb15f1480bf95a0\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">离子注入是一种将特定离子在电场里加速，然后嵌入到另一固体材料之中的技术手段。使用这个技术可以改变固体材料的物理化学性质，现在已经广泛应用于半导体器件制造和某些材料科学研究。离子注入可以导致核转变，或改变某些固体材料的晶体结构。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;text-align:center\\\"><img src=\\\":/643b52f1e1f448bf93683d0fe3a22d36\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></strong><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';margin-bottom:-10px;font-size:16px;letter-spacing:1px;line-height:0;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:center;font-weight:bold;white-space:normal\\\"><img src=\\\":/ad193a1885ec4cd49c1b1bf99a6c72af\\\" type=\\\"image/png\\\" data-filename=\\\"640.png\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:15px;display:inline-block;left:0;transform:rotateX(60deg);margin-top:5px !important;width:632px !important;height:auto !important;visibility:visible !important\\\" width=\\\"632px\\\"/></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-family:'Helvetica Neue';font-size:15px;letter-spacing:1px;line-height:1.8;color:rgb(60,60,60);padding-right:10px;padding-left:9px;text-align:justify;white-space:normal\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">光刻胶的主要功能是在整个区域进行化学或机械处理工艺时，保护光刻胶下的衬底部分。所以当以上工艺结束之后，光刻胶应全部去除，这一步骤简称去胶。只有那些高温稳定的光刻胶，例如光敏感聚酰亚胺，可以作为中间介质或缓冲涂层而留在器件上。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">为避免对被处理表面的任何损伤，应当使用低温下温和的化学方法。超声波的应用也可以增强剥离效能。因为有腐蚀问题、一些已知的剥离液不能作用与铝等金属表面；在此情况下、臭氧或氧等离子体(灰化)是首先采用的。这些等离子体同样成功地作为非铝表面的光刻交剥离剂，但是，器件表面的损坏仍是要解决的问题。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">刻蚀或离子注入之后，已经不再需要光刻胶作保护层，可以将其除去。去胶的方法分类如下：</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">湿法去胶</strong></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">有机溶剂去胶：</strong>利用有机溶剂除去光刻胶</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">无机溶剂：</strong>通过使用一些无机溶剂，将光刻胶这种有机物中的碳元素氧化为二氧化碳，进而而将其除去</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">干法去胶：</strong>利用等离子体将光刻胶剥除</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">除了这些主要的工艺以外，还经常采用一些辅助过程，比如进行大面积的均匀腐蚀来减小衬底的厚度，或者去除边缘不均匀的过程等等。一般在生产半导体芯片或者其它元件时，一个衬底需要多次重复光刻。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;letter-spacing:1px;line-height:1.75em\\\">以上是光刻的步骤，特此收集给大家，希望指正。</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;white-space:normal;line-height:25.6px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-bottom:15px;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">今天是《半导体行业观察》为您分享的第1390期内容，欢迎关注。</strong></span></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;white-space:normal;line-height:25.6px;letter-spacing:0.5px\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><div style=\\\"padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin:10px 0;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;width:556px;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;padding-right:3px;line-height:1;float:left;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;font-size:48px;letter-spacing:0\\\"><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><em style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-style:italic\\\">R</em></p></div></div></div></div><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;clear:right;letter-spacing:0;min-height:4.5em !important\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;letter-spacing:0\\\"><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;min-height:1em;margin-right:0;margin-left:0;clear:none;letter-spacing:0\\\">eading</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;min-height:1em;margin-right:0;margin-left:0;clear:none;letter-spacing:0\\\">推荐阅读（点击文章标题，直接阅读）</p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;min-height:1em;margin-right:0;margin-left:0;clear:none;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px\\\">★</span><a href=\\\"http://mp.weixin.qq.com/s?__biz=MzU3OTA0MjQ3Mg==&amp;mid=2247497231&amp;idx=1&amp;sn=4f6bd8ba4c36f9849b10662bfff9f5ba&amp;chksm=fd6e9bc8ca1912de7fea640cc5fc54315db69b0f09331fbe4bac49620a40f5b2d1fa99ee7df3&amp;scene=21#wechat_redirect\\\" style=\\\"margin:0;padding:0;color:#607fa6;text-decoration:none;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\" target=\\\"_blank\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px;text-decoration:underline\\\">再见，SPARC处理器！再见，SUN！</span></a></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;min-height:1em;margin-right:0;margin-left:0;clear:none;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px\\\">★</span><a href=\\\"http://mp.weixin.qq.com/s?__biz=MzU3OTA0MjQ3Mg==&amp;mid=2247497138&amp;idx=1&amp;sn=6cf60253c4006808a0e6b196146edcd0&amp;chksm=fd6e9875ca19116398925808c87db29f04e2bcb7e8386e4f856a1d864eec1ecd64ee61733344&amp;scene=21#wechat_redirect\\\" style=\\\"margin:0;padding:0;color:#607fa6;text-decoration:none;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\" target=\\\"_blank\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px;text-decoration:underline\\\">iPhone 8降临，能否改变无线充电的命运？</span></a></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;min-height:1em;margin-right:0;margin-left:0;clear:none;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px\\\">★</span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:16px;line-height:25.6px;text-decoration:underline\\\"><a href=\\\"http://mp.weixin.qq.com/s?__biz=MzU3OTA0MjQ3Mg==&amp;mid=2247497181&amp;idx=1&amp;sn=2b3e681f3460274a37b2abecee069527&amp;chksm=fd6e981aca19110cfabb840ca698c12d0fac4aabe723a4c0134f0b353b960d1755828a7f7207&amp;scene=21#wechat_redirect\\\" style=\\\"margin:0;padding:0;color:#607fa6;text-decoration:none;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\" target=\\\"_blank\\\">一年暴涨84%，美光将迎来黄金时代？</a></span></p></div></div></div></div></div></div></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">关注微信公众号 <strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">半导体行业观察</strong>，后台回复关键词获取更多内容</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">回复 <span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,169,0)\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">比亚迪</strong></span>，看《比亚迪的芯片布局，王传福的野心》</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">回复 </span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,169,0)\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">长电科技</span></strong></span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">，看《从江阴小厂到世界前三，长电科技一路狂奔》</span></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\">回复 <span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,169,0);line-height:25.6px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">英特尔</strong></span>，看《四面楚歌，Intel还能重回巅峰吗？》</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\">回复<span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,169,0);line-height:25.6px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"> 全面屏</strong></span>，看《全面屏手机给供应链带来的挑战》</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\">回复 <span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,169,0);line-height:25.6px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">芯片市场</strong></span>，看《又一个被中国厂商做死的芯片市场！》</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\">回复</span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(120,172,254);line-height:25.6px;font-size:15px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"> 展会</strong></span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:14px\\\">，看《2017最新半导体展会会议日历》</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:15px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">回复</span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(120,172,254);line-height:25.6px\\\"> <strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">投稿</strong></span><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px\\\">，看《如何成为“半导体行业观察”的一员 》</span></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:25.6px;font-size:15px\\\">回复 <span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(120,172,254);line-height:25.6px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">搜索</strong></span>，还能轻松找到其他你感兴趣的文章！</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;color:inherit;font-size:16px;letter-spacing:0;white-space:normal;line-height:25.6px;text-align:right\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:rgb(255,255,255);font-size:17px;background-color:rgb(255,76,65)\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">摩尔邀请您加入精英微信群</strong></span></p><div style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-top:-1px;margin-right:0;margin-left:0;color:inherit;font-size:16px;white-space:normal;letter-spacing:0.5px;border-radius:2px;border-width:1px;border-style:solid;border-color:rgb(0,107,186);line-height:22px;clear:both\\\"><div style=\\\"margin:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;margin-right:0;margin-left:0;padding:10px;color:inherit;letter-spacing:0\\\"><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;color:inherit;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">你好，感谢长期对半导体行业观察的关注和支持！为了方便各位精英专家交流，我们组建了一些专业、微信交流群，欢迎你加入，我们还会邀请在摩尔直播App做过技术和行业分享的100+技术大牛入群和大家交流。加群方法： 长按二维码，加群主为好友，填写加群需求信息，拉你入群。（微信限制每天好友添加数量只有300人，请耐心等待）</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;text-align:center;letter-spacing:0\\\"><img src=\\\":/1d1da91002ea41a496ebdac9c74eb108\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important;width:196.82px\\\"/><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:inherit;font-size:14px\\\"></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;color:inherit;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:inherit;font-size:11pt\\\">地域群：</span></strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">上海、深圳、北京、江苏.浙江、西安、武汉、成都.重庆、合肥、厦门.晋华、大连、台湾、新加坡、日本.韩国、美国、欧洲、摩尔直播学习群。</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:11pt\\\">专业群：</span></strong><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:11pt\\\"></span></strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">模拟射频设计、EDA.IP、数字芯片设计、模拟混合信号设计、版图Layout、数字PR.验证、晶圆制造Fab、设备EE、半导体材料、半导体设备、封装测试、半导体投资、市场销售、AE.FAE、嵌入式开发、实习交流、采购.IC代理、AI芯片</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;color:inherit\\\"></strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\"><strong style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\">专业微信群规则：</strong></span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">1. 专业、高效交流，建议进群请修改群昵称，格式：公司或学校+职位或专业+中文或英文，请服从群主管理，如果多次违规会被请出交流群；</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">2. 原则上每人加不超过3个群，精彩讨论内容，群主会负责在不同群同步，既然加了群，请大家尽量置顶群，积极参与群讨论；</span></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;font-size:14px\\\">3. 群里聊天讨论仅限半导体专业内容，杜绝专业无关内容，特别是养生、拉票、微商等内容，严格禁止，为自己公司打广告以不引起群友反感为限；</span></p></div></div><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em\\\"><br style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><img src=\\\":/3e6c41249cd3474fbcfa57e79d4e172d\\\" type=\\\"image/jpeg\\\" data-filename=\\\"0.jpg\\\" style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;height:auto !important\\\"/></p><p style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;clear:both;min-height:1em;margin-right:0;margin-bottom:5px;margin-left:0;letter-spacing:0;white-space:normal;line-height:25.6px\\\"><span style=\\\"margin:0;padding:0;max-width:100% !important;box-sizing:border-box !important;-webkit-box-sizing:border-box !important;word-wrap:break-word !important;line-height:1.5em;text-indent:0;font-family:微软雅黑\\\">点击阅读原文加入摩尔精英</span></p></div></div><div style=\\\"margin:0;padding:0\\\"><a href=\\\"http://mp.weixin.qq.com/s?__biz=MzU3OTA0MjQ3Mg==&amp;mid=2247497271&amp;idx=1&amp;sn=4e8c111be91a013079ff216e40209e1d&amp;chksm=fd6e9bf0ca1912e6dfd3ca8e4a6fe1009c586e0df499a4ea76c94bba1ee7320c567e3aa81bd9&amp;mpshare=1&amp;scene=1&amp;srcid=0909Fc7DXmGECER9bQYuyBLR##\\\" style=\\\"margin:0;padding:0;color:#607fa6;text-decoration:none\\\">阅读原文</a></div></div></div></span>\\\n</div></body></html>\\u0000\"]],\"start1\":0,\"start2\":0,\"length1\":0,\"length2\":117729}]"
metadata_diff: {"new":{"id":"9b054c138338408f81f3af2f6b5beca4","parent_id":"061de1401cfc4cfaadf6e74e015970e9","latitude":"0.00000000","longitude":"0.00000000","altitude":"0.0000","author":"","source_url":"","is_todo":0,"todo_due":0,"todo_completed":0,"source":"joplin-desktop","source_application":"net.cozic.joplin-desktop","application_data":"","order":1764345889562,"markup_language":2,"is_shared":0,"share_id":"","conflict_original_id":"","master_key_id":"","user_data":"","deleted_time":0},"deleted":[]}
encryption_cipher_text: 
encryption_applied: 0
updated_time: 2025-11-28T16:20:27.134Z
created_time: 2025-11-28T16:20:27.134Z
type_: 13