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ocr_text: Challenges in III-V/Si Hetero-Epitaxy\n» Development of surface preparation processes\n===) Importance of the III-V/Si surface engineering to control the APD generation\n<< Promotion of double-layer steps at the surface\n» Si (001) substrate (with a 0.15° misorientation in the [110] direction) is deoxidized in using NF3/NH;\nremote plasma and then annealed (1 min-10 min) in an MOCVD reactor at high temperature\n(800 °C-950 °C) in H, ambient.\n= fl\nus\n| |\nX [um] X [um] X [um]\nFig. 5. (a) 5 x 5 um? AFM image of 400 nm thick GaAs growth on un-optimized Si(001): High density of randomly oriented APBs; RMS roughness = 1.6 nm. (b) 2 x 2 um® AFM image of\n0.1551 (001) ate optimized peparation (800 C-950C annealing under Hs). The surface i therefore mainly double stepped. (5 x 5 um” APM image of APB free 1» thick ops, ||. _,
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